IMPRINTING AND RESIDUE FREE PATTERNED SUBSTRATES

The present disclosure relates to a patterned substrate having a surface relief structure comprising a plurality of isolated and laterally separated elements of a cured polymer composition. The present disclosure further relates to a stamp, system, and methods of manufacturing. A method comprises: providing a stamp (); depositing a flowable photocurable layer () onto a carrier substrate; imprinting the layer, by pressing (P) the stamp into the layer, selectively curing the photocurable layer while imprinting by providing a photonic exposure (L) onto the photocurable layer thereby forming the relief structure, and clearing uncured residues of the photocurable layer, if present, from the stamp and/or the carrier substrate, wherein the stamp protrusions comprise an opaque cap () that extends along a terminal end face () of the protrusions, and wherein the cap comprises a polymer or a composite, preferably an elastomer or elastomer composite.