{
  "$type": "site.standard.document",
  "description": "The present disclosure relates to a patterned substrate having a surface relief structure comprising a plurality of isolated and laterally separated elements of a cured polymer composition. The present disclosure further relates to a stamp, system, and methods of manufacturing. A method comprises…",
  "path": "/patents/1426572",
  "publishedAt": "2026-06-25T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01M4/0409",
    "LionVolt B.V."
  ],
  "textContent": "The present disclosure relates to a patterned substrate having a surface relief structure comprising a plurality of isolated and laterally separated elements of a cured polymer composition. The present disclosure further relates to a stamp, system, and methods of manufacturing. A method comprises: providing a stamp (); depositing a flowable photocurable layer () onto a carrier substrate; imprinting the layer, by pressing (P) the stamp into the layer, selectively curing the photocurable layer while imprinting by providing a photonic exposure (L) onto the photocurable layer thereby forming the relief structure, and clearing uncured residues of the photocurable layer, if present, from the stamp and/or the carrier substrate, wherein the stamp protrusions comprise an opaque cap () that extends along a terminal end face () of the protrusions, and wherein the cap comprises a polymer or a composite, preferably an elastomer or elastomer composite.",
  "title": "IMPRINTING AND RESIDUE FREE PATTERNED SUBSTRATES"
}