IMPROVING STRUCTURED LIGHT PROJECTION THROUGH THE MINIMIZATION OF VISUAL ARTIFACTS BY WAY OF DELIBERATELY INTRODUCED OPTICAL ABERRATIONS

Triangulation device (8,9,10) for measuring a measurement object (12) by a projection of a structured light pattern (11) onto the measurement object (12), the triangulation device comprising a projector (8) configured to project the structured light pattern (11) onto the measurement object (12), the structured light pattern (11) being decomposable into different spatial frequencies, the projector comprising a matrix of pixel elements (4,5,6,7), wherein an artifact pattern is defined by artifact regions (2,3) between neighboring pixel elements, and a lens system, wherein the lens system determines a wavefront with a wavefront aberration from a reference wavefront, and a camera (9,10), the camera comprising a lens system and an imaging sensor (10), wherein the camera is configured to receive the structured light pattern (11) projected by the projector (8) onto the measurement object (12), and a processing unit configured to provide distance information by evaluating imaging information provided by the camera (9,10), wherein the wavefront aberration, if described by a Zernike decomposition, comprises a primary spherical aberration coefficient Z, wherein the Zernike polynomials are ordered according to the Fringe Zernike coefficient ordering, wherein the primary spherical aberration coefficient Z is larger than 0.25λ, wherein λ is a wavelength of the projection light.