LITHIUM PRECURSORS FOR DEPOSITION OF LITHIUM-CONTAINING LAYERS, ISLETS OR CLUSTERS

Methods for forming a Li-containing film, islet or cluster on a substrate comprise the steps of introducing a vapor of a silicon-free lithium precursor into a reactor and depositing at least part of the silicon-free lithium precursor onto the substrate to form the Li-containing film, islet or cluster using a vapor deposition method.