{
  "$type": "site.standard.document",
  "description": "A method for manufacturing a solid electrolyte, including: (a) disposing a substrate in the reaction chamber of an atomic thin film deposition reactor; (b) providing a pulse of a first chemical precursor in the reaction chamber; (c) purging the reaction chamber; (d) providing a pulse of a second…",
  "path": "/patents/1426461",
  "publishedAt": "2026-06-25T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "C23C16/45555",
    "Commissariat à l'Energie Atomique et aux Energies Alternatives"
  ],
  "textContent": "A method for manufacturing a solid electrolyte, including: (a) disposing a substrate in the reaction chamber of an atomic thin film deposition reactor; (b) providing a pulse of a first chemical precursor in the reaction chamber; (c) purging the reaction chamber; (d) providing a pulse of a second chemical precursor in the reaction chamber; (e) purging the reaction chamber; (f) repeating steps (d) and (e) with another chemical precursor; (g) repeating steps (b) to (e) or, when step (f) is performed, steps (b) to (f), until a desired thickness of the solid electrolyte is obtained. The manufacturing process further comprises a step (h) consisting in providing a pulse of an inert gas for a determined time in the reaction chamber.",
  "title": "PROCESS FOR MANUFACTURING A SOLID ELECTROLYTE FOR AN ELECTROCHEMICAL DEVICE"
}