ANTI-CORROSION CONDUCTIVE FILM AND PULSE BIAS ALTERNATION-BASED MAGNETRON SPUTTERING DEPOSITION METHOD AND APPLICATION THEREOF

The invention relates to an anti-corrosion conductive film and a pulse bias alternation-based magnetron sputtering deposition method and application thereof. The anti-corrosion conductive film is formed by sequentially forming an anti-corrosion protective layer, a stress transition layer and a conducting layer on the surface of a substrate by deposition through a high-low pulse bias alternation method. Compared with the prior art, the invention has the following advantages: high and low biases, the proportion of deposition times and the number of alternations are adjusted to control a nano-multilayer anti-corrosion conductive film to develop towards higher conductivity; and the bias alternation strategy inhibits the growth of columnar structures of the nano-multilayer alternate coating structure, thus avoiding a corrosion channel and improving the corrosion resistance, and changes the micro-structure of the coating through bias modulation, thus improving the conductivity and galvanic corrosion, so that the nano-multilayer anti-corrosion conductive film has better comprehensive performance such as the corrosion resistance and the conductivity and has great application prospects in the fields of metal polar plates of fuel cells, ground grid equipment of power transmission lines, and the like.