{
  "$type": "site.standard.document",
  "description": "Methods of forming electrochemical cells are described. In some implementations, the method can include providing an electrochemical cell having an electrode with at least about 20% to about 99% by weight of silicon. The method can include providing a formation charge current at a first rate and at…",
  "path": "/patents/1292565",
  "publishedAt": "2021-06-10T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01M4/1395",
    "Enevate Corporation"
  ],
  "textContent": "Methods of forming electrochemical cells are described. In some implementations, the method can include providing an electrochemical cell having an electrode with at least about 20% to about 99% by weight of silicon. The method can include providing a formation charge current at a first rate and at a second rate to the electrochemical cell. The first rate can be in a range from about C/100 to about C/10 and the second rate can be greater than about C/10.",
  "title": "METHODS OF FORMING ELECTROCHEMICAL CELLS WITH A COMBINATION FORMATION CHARGE RATE"
}