{
  "$type": "site.standard.document",
  "description": "A method of manufacturing a cathode for a thin-film solid state battery, a method of manufacturing a thin-film arrangement comprising an electrolyte layer and a method of manufacturing a thin-film solid state battery are disclosed, wherein one or more of the layers in these arrangement are…",
  "path": "/patents/1416619",
  "publishedAt": "2026-06-17T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01M10/0525",
    "BTRY AG [CH]"
  ],
  "textContent": "A method of manufacturing a cathode for a thin-film solid state battery, a method of manufacturing a thin-film arrangement comprising an electrolyte layer and a method of manufacturing a thin-film solid state battery are disclosed, wherein one or more of the layers in these arrangement are deposited using direct current, DC, sputtering processes. Further, a corresponding solid state battery is disclosed.",
  "title": "METHOD OF MANUFACTURING A THIN-FILM SOLID STATE BATTERY USING DIRECT CURRENT SPUTTERING"
}