{
  "$type": "site.standard.document",
  "description": "A method for producing a halide includes heat-treating a mixed material in an inert gas atmosphere, the mixed material being a mixture of (NH)MXand LiZ. The M includes at least one element selected from the group consisting of Y, a lanthanoid, and Sc. The X is at least one element selected from the…",
  "path": "/patents/1298915",
  "publishedAt": "2021-09-02T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "C01F17/271",
    "Panasonic Intellectual Property Management Co., Ltd."
  ],
  "textContent": "A method for producing a halide includes heat-treating a mixed material in an inert gas atmosphere, the mixed material being a mixture of (NH)MXand LiZ. The M includes at least one element selected from the group consisting of Y, a lanthanoid, and Sc. The X is at least one element selected from the group consisting of Cl, Br, I, and F. The Z is at least one element selected from the group consisting of Cl, Br, I, and F. Furthermore, 0",
  "title": "HALIDE PRODUCTION METHOD"
}