{
  "$type": "site.standard.document",
  "description": "The fabrication of robust interfaces between transition metal oxides and non-aqueous electrolytes is one of the great challenges of lithium ion batteries. Atomic layer deposition (ALD) of aluminum tungsten fluoride (AlWF) improves the electrochemical stability of LiCoO. AlWFthin films were…",
  "path": "/patents/1313289",
  "publishedAt": "2022-03-17T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01M4/0421",
    "UCHICAGO ARGONNE, LLC"
  ],
  "textContent": "The fabrication of robust interfaces between transition metal oxides and non-aqueous electrolytes is one of the great challenges of lithium ion batteries. Atomic layer deposition (ALD) of aluminum tungsten fluoride (AlWF) improves the electrochemical stability of LiCoO. AlWFthin films were deposited by combining trimethylaluminum and tungsten hexafluoride. in-situ quartz crystal microbalance and transmission electron microscopy studies show that the films grow in a layer-by-layer fashion and are amorphous nature. Ultrathin AlWFcoatings (",
  "title": "METAL FLUORIDE PASSIVATION COATINGS PREPARED BY ATOMIC LAYER DEPOSITION FOR LI-ION BATTERIES"
}