{
  "$type": "site.standard.document",
  "description": "A method for forming a MEMS structure for an inertial sensor from fused silica comprises depositing a conductive layer (401) on one or more selected regions of a first surface of a fused silica substrate (400), and illuminating areas of the fused silica substrate (400) with laser radiation in a…",
  "path": "/patents/1401893",
  "publishedAt": "2025-10-22T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "B81B3/0072",
    "ATLANTIC INERTIAL SYSTEMS LTD [GB]"
  ],
  "textContent": "A method for forming a MEMS structure for an inertial sensor from fused silica comprises depositing a conductive layer (401) on one or more selected regions of a first surface of a fused silica substrate (400), and illuminating areas of the fused silica substrate (400) with laser radiation in a pattern defining features of the MEMS structure for an inertial sensor. A masking layer (404) is deposited at least on the one or more selected regions of the first surface of the fused silica substrate (400) where the conductive layer (401) has been deposited, such that the illuminated areas of the fused silica substrate (400) remain exposed. A first etch of the exposed areas of the fused silica substrate (400) is performed so as to selectively etch the pattern defining features (415) of the MEMS structure for an inertial sensor.",
  "title": "FABRICATION OF MEMS STRUCTURES FROM FUSED SILICA FOR INERTIAL SENSORS"
}