{
  "$type": "site.standard.document",
  "description": "Methods of forming electrochemical cells are described. In some implementations, the method can include providing an electrochemical cell having an electrode including electrochemically active material with at least about 20% to about 100% by weight of silicon. The method can include charging the…",
  "path": "/patents/1326527",
  "publishedAt": "2022-09-08T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01M4/1395",
    "Enevate Corporation"
  ],
  "textContent": "Methods of forming electrochemical cells are described. In some implementations, the method can include providing an electrochemical cell having an electrode including electrochemically active material with at least about 20% to about 100% by weight of silicon. The method can include charging the electrochemical cell by providing a formation charge current at about 1 C or greater to the electrochemical cell. The method can also include discharging the electrochemical cell. In various implementations, substantially no rest of greater than about 5 minutes occurs between charging and discharging.",
  "title": "METHODS OF FORMING ELECTROCHEMICAL CELLS"
}