{
  "$type": "site.standard.document",
  "description": "This disclosure relates to a cross-linking polymer including polyamide-based segments having a specific structure and polyether-based segments having a specific structure, wherein the polyamide-based segments are bound to the polyether-based segments via a residue of an aromatic compound including…",
  "path": "/patents/956020",
  "publishedAt": "2015-11-04T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "B60C1/0008",
    "KOLON INC [KR]"
  ],
  "textContent": "This disclosure relates to a cross-linking polymer including polyamide-based segments having a specific structure and polyether-based segments having a specific structure, wherein the polyamide-based segments are bound to the polyether-based segments via a residue of an aromatic compound including at least one amine group and at least one carboxylic group, a polymer resin composition including the cross-linking polymer and a polyamide-based resin having relative viscosity of 2.5 to 4.0, and a polymer film including a base film layer including a melt-extrusion of the polymer resin composition.",
  "title": "CROSS-LINKED POLYMER, POLYMER RESIN COMPOSITION, AND POLYMER FILM"
}