{
  "$type": "site.standard.document",
  "description": "The purpose of the present invention is to improve the throughput of a dye adsorption process in which a dye is adsorbed in a porous semiconductor layer on a substrate and to improve dye use efficiency. In a dye adsorption device of the present invention, a dye solution drop-coating unit 12…",
  "path": "/patents/975398",
  "publishedAt": "2014-05-07T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01G9/0029",
    "TOKYO ELECTRON LTD [JP]"
  ],
  "textContent": "The purpose of the present invention is to improve the throughput of a dye adsorption process in which a dye is adsorbed in a porous semiconductor layer on a substrate and to improve dye use efficiency. In a dye adsorption device of the present invention, a dye solution drop-coating unit 12 performs a first process (dye solution drop-coating process) on an unprocessed substrate G carried in the dye adsorption device 10, in which a dye solution is dropped and coated on a porous semiconductor layer on the substrate G. A solvent evaporating/removing unit 14 performs a second process (solvent removing process) in which a solvent is evaporated and removed from the dye solution coated on the semiconductor layer on the substrate G. A rinsing unit 16 performs a third process (rinsing process) in which unnecessary or extra dye attached to the surface of the semiconductor layer n the substrate G is rinsed and removed.",
  "title": "DYE ADSORPTION DEVICE AND DYE ADSORPTION METHOD"
}