{
  "$type": "site.standard.document",
  "description": "The method involves producing an open-pored and fluid-permeable support material (122) i.e. oxide forming material, which includes pores (124) forming a cavity (126) in the support material. A protection layer (130) is produced at an inner surface (128) of the support material by superficial…",
  "path": "/patents/982845",
  "publishedAt": "2013-10-23T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01M8/0232",
    "DEUTSCH ZENTR LUFT & RAUMFAHRT [DE]"
  ],
  "textContent": "The method involves producing an open-pored and fluid-permeable support material (122) i.e. oxide forming material, which includes pores (124) forming a cavity (126) in the support material. A protection layer (130) is produced at an inner surface (128) of the support material by superficial oxidation of the support material, where the inner surface defines the cavity. An electron-conductive structure (134) extending within the cavity of the support material is produced. The electron-conductive structure is formed from a ceramic material. Independent claims are also included for the following: (1) a support substrate (2) an electrochemical device.",
  "title": "Method for producing a carrier substrate, carrier substrate and electrochemical device"
}