{
  "$type": "site.standard.document",
  "description": "The bipolar plate has plate elements (10,12) between which flow field with flow inlet (6) and flow outlet (8) is arranged. Both first and second embossments (14,24) of plate elements have aperture to contact plane of plate element. The flow channels are formed by apertures of embossments by offset…",
  "path": "/patents/986626",
  "publishedAt": "2013-09-18T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01M8/0228",
    "SIEMENS AG [DE]"
  ],
  "textContent": "The bipolar plate has plate elements (10,12) between which flow field with flow inlet (6) and flow outlet (8) is arranged. Both first and second embossments (14,24) of plate elements have aperture to contact plane of plate element. The flow channels are formed by apertures of embossments by offset of embossments against one another such that embossment of one plate element partially overlaps embossment of other plate element. The second embossments are made smaller than first embossments, such that flow channels are restricted or interrupted in region of second embossments.",
  "title": "Bipolar plate and electrochemical cell with such a bipolar plate"
}