{
  "$type": "site.standard.document",
  "description": "Methods of forming electrochemical cells are described. An electrochemical cell may be provided, with the electrochemical cell including a first electrode and a second electrode, wherein at least the first electrode includes up to about 99% by weight of silicon, a separator between the first…",
  "path": "/patents/1372309",
  "publishedAt": "2025-01-02T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01M4/1395",
    "Enevate Corporation"
  ],
  "textContent": "Methods of forming electrochemical cells are described. An electrochemical cell may be provided, with the electrochemical cell including a first electrode and a second electrode, wherein at least the first electrode includes up to about 99% by weight of silicon, a separator between the first electrode and the second electrode, and an electrolyte in contact with the first electrode, the second electrode, and the separator. During a formation process, a formation charge current may be at a first rate of constant current and at a second rate of constant current to the electrochemical cell. The first rate is less than the second rate. The providing may include providing the formation charge current at the first rate of constant current until a rate switching condition is met; and providing the formation charge current at the second rate of constant current after the rate switching condition is met.",
  "title": "METHODS OF FORMING ELECTROCHEMICAL CELLS WITH A COMBINATION FORMATION CHARGE RATE"
}