PLASMA-GENERATING APPARATUS

The plasma generation device 30 is provided with a high frequency generation device 37 that generates a high frequency wave, and a high frequency radiator 15 that radiates the high frequency wave outputted from the high frequency generation device 37 to a target space 10, and generates plasma by supplying energy of the high frequency wave to the target space 10. In the plasma generation device 30, the high frequency generation device 37 is provided with an oscillator 41 that oscillates a high frequency wave, and an amplifier 42 that amplifies and outputs the high frequency wave oscillated by the oscillator 41 to the high frequency radiator 15. In the high frequency generating device 37the amplifier 42 alone is integrated with the high frequency radiator 15, from among the oscillator 41 and the amplifier 42.