{
  "$type": "site.standard.document",
  "description": "The present invention provides a method for manufacturing a negative electrode active material for a secondary battery that uses a non-aqueous electrolyte, including the steps of: depositing silicon according to an electron beam vapor-deposition method with metallic silicon as a raw material on a…",
  "path": "/patents/990977",
  "publishedAt": "2013-05-08T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "B82Y30/00",
    "SHINETSU CHEMICAL CO [JP]"
  ],
  "textContent": "The present invention provides a method for manufacturing a negative electrode active material for a secondary battery that uses a non-aqueous electrolyte, including the steps of: depositing silicon according to an electron beam vapor-deposition method with metallic silicon as a raw material on a substrate of which temperature is controlled from 800 to 1100°C at a vapor deposition rate exceeding 1 kg/hr in the range of film thickness of 2 to 30 mm; and pulverizing and classifying the deposited silicon to obtain the negative electrode active material. As a result, there is provided a method for manufacturing a negative electrode active material of silicon particles as an active material useful for a negative electrode of a non-aqueous electrolyte secondary battery that is, while maintaining high initial efficiency and battery capacity of silicon, excellent in the cycle characteristics and has a reduced volume change during charge/discharge.",
  "title": "Negative electrode active material for non-aqueous electrolyte secondary battery and method for manufacturing the same"
}