{
  "$type": "site.standard.document",
  "description": "A method for forming a metal-containing film comprises: wherein, M is a transition metal, a rare earth element, an alkali metal, or an alkaline earth metal; R, R, R, Rand Reach are independently selected from a hydrogen atom, a Cto Clinear or branched alkyl-group, a Cto Ccyclic alkyl- group, or F…",
  "path": "/patents/1380738",
  "publishedAt": "2026-04-09T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "C23C16/405",
    "L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude"
  ],
  "textContent": "A method for forming a metal-containing film comprises: wherein, M is a transition metal, a rare earth element, an alkali metal, or an alkaline earth metal; R, R, R, Rand Reach are independently selected from a hydrogen atom, a Cto Clinear or branched alkyl-group, a Cto Ccyclic alkyl- group, or F, Si, Ge containing Cto Clinear and branched alkyl chain; x and y are integers; provided that x+y equals to the oxidation state of M.",
  "title": "METAL CHLORIDE PRECURSORS AND DEPOSITION OF METAL-CONTAINING FILMS"
}