{
  "$type": "site.standard.document",
  "description": "Methods of forming electrochemical cells are described. In some embodiments, the method can include providing an electrochemical cell having an electrode with at least about 20% to about 99% by weight of silicon. The method can include providing a formation charge current at greater than about 1C…",
  "path": "/patents/1380835",
  "publishedAt": "2026-04-09T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01M10/0525",
    "Enevate Corporation"
  ],
  "textContent": "Methods of forming electrochemical cells are described. In some embodiments, the method can include providing an electrochemical cell having an electrode with at least about 20% to about 99% by weight of silicon. The method can include providing a formation charge current at greater than about 1C to the electrochemical cell. Alternatively or additionally, the method can include providing a formation charge current at a substantially constant charge voltage to the electrochemical cell.",
  "title": "METHODS OF FORMING ELECTROCHEMICAL CELLS"
}