{
  "$type": "site.standard.document",
  "description": "[Object] To provid a polypropylene resin composition for use in the formation of a microporous membrane having excellent heat resistance and low thermal shrinkage ratio. [Solution] A polypropylene resin composition for use in the formation of a microporous membrane according to the present…",
  "path": "/patents/1008782",
  "publishedAt": "2011-10-12T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "C08F110/06",
    "MITSUI CHEMICALS INC [JP]"
  ],
  "textContent": "[Object] To provid a polypropylene resin composition for use in the formation of a microporous membrane having excellent heat resistance and low thermal shrinkage ratio. [Solution] A polypropylene resin composition for use in the formation of a microporous membrane according to the present invention comprises as an essential component a propylene homopolymer (A) that satisfies the following requirements (1) to (4) and (7): (1) the intrinsic viscosity [·] is 1 dl/g or more and less than 7 dl/g; (2) the mesopentad fraction ranges from 94.0% to 99.5%; (3) the integral elution volume during heating to 100°C is 10% or less; (4) the melting point ranges from 153°C to 167°C; and (7) in an elution temperature-elution volume curve, the maximum peak has a peak top temperature in the range of 105°C to 130°C and a half-width of 7.0°C or less.",
  "title": "POLYPROPYLENE RESIN COMPOSITION FOR MICROPOROUS FILM FORMATION"
}