SYSTEM AND METHOD FOR MANUFACTURING A MICROPILLAR ARRAY

A system and method for manufacturing a micropillar array (). A carrier () is provided with a layer of metal ink (). A high energy light source () irradiates the metal ink () via a mask () between the carrier () and the light source. The mask is configured to pass a cross-section illuminated image of the micropillar array onto the metal ink (), thereby causing a patterned sintering of the metal ink () to form a first subsection layer () of the micropillar array () in the layer of metal ink (). A further layer of the metal ink () is applied on top of the first subsection layer () of the micropillar array () and irradiated via the mask () to form a second subsection layer () of the micropillar array on top. The process is repeated to achieve high aspect ratio micropillars