{
  "$type": "site.standard.document",
  "description": "The deposition under vacuum of a catalytic layer on a gas electrode (4) in an enclosure (31) is assisted by ionic bombardment of the electrode during the deposition of the catalyst. An independent claim is also included for a device for the deposition of a catalytic layer on a gas electrode.",
  "path": "/patents/1075589",
  "publishedAt": "2005-07-27T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "C23C14/0031",
    "SAGEM [FR]"
  ],
  "textContent": "The deposition under vacuum of a catalytic layer on a gas electrode (4) in an enclosure (31) is assisted by ionic bombardment of the electrode during the deposition of the catalyst. An independent claim is also included for a device for the deposition of a catalytic layer on a gas electrode.",
  "title": "Process and dispositive for manufacturing a catalytique layer"
}