{
  "$type": "site.standard.document",
  "coverImage": {
    "$type": "blob",
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    "mimeType": "image/png",
    "size": 111886
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  "description": "Provided is a compound including residues derived from a compound represented by Formula (1) and a divalent aromatic group, wherein the number of the residues is 2 to 4, the number of the divalent aromatic group is 1 to 3, and the sum of the numbers of the residues and the divalent aromatic group…",
  "path": "/patents/1118058",
  "publishedAt": "2013-08-15T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "H01M4/8652",
    "SUMITOMO CHEMICAL COMPANY, LIMITED"
  ],
  "textContent": "Provided is a compound including residues derived from a compound represented by Formula (1) and a divalent aromatic group, wherein the number of the residues is 2 to 4, the number of the divalent aromatic group is 1 to 3, and the sum of the numbers of the residues and the divalent aromatic group is 3 to 5. In Formula (1), each of Yto Yrepresent a group represented by any of the following Formula (2); in the following Formula (2), R represents a hydrogen atom or a hydrocarbyl group; each of Pto Prepresents an atomic group forming a heterocyclic ring containing Yto Y; Pand Prepresent an atomic group forming an aromatic ring or a heterocyclic ring; Qand Qrepresent a linking group or a direct bond; and Zand Zrepresent a hydrogen atom or a group represented by any of the following Formula (3); and in the following Formula (3), Rrepresents a hydrogen atom or a hydrocarbyl group.",
  "title": "METAL COMPLEX, MODIFIED COMPOUND THEREOF AND USEFUL COMPOUND THEREOF"
}