{
  "$type": "site.standard.document",
  "coverImage": {
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  "description": "The mass flowrate ratio is controlled. Temperatures are measured using a resistance thermometer (1). Its sensor (10) is made of resistance wire with a positive temperature coefficient. It is located in or on the support structure, between its two ends (21, 22), so than an integral temperature…",
  "path": "/patents/1092886",
  "publishedAt": "2003-10-01T00:00:00.000Z",
  "site": "at://did:plc:oql6ds5vnff4ugar6rruliwd/site.standard.publication/3mn3ohu7oxx5w",
  "tags": [
    "B01J19/0013",
    "SULZER HEXIS AG [CH]"
  ],
  "textContent": "The mass flowrate ratio is controlled. Temperatures are measured using a resistance thermometer (1). Its sensor (10) is made of resistance wire with a positive temperature coefficient. It is located in or on the support structure, between its two ends (21, 22), so than an integral temperature measurement is produced between them. An Independent claim is included for the corresponding reactor.",
  "title": "Process for regulating the reactions between at least two gaseous components"
}