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  "path": "/tech-industry/semiconductors/asml-makes-breakthrough-in-euv-chipmaking-tech-plans-to-increase-speed-by-50-percent-by-2030-new-1-000-watt-light-source-fires-three-lasers-at-100-000-tin-droplets-every-second",
  "publishedAt": "2026-02-24T12:01:57.000Z",
  "site": "https://www.tomshardware.com",
  "tags": [
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  "textContent": "ASML to use a new CO2 laser system and tin droplet generator to increase EUV light source performance to 1000W and lithography tool productivity to 330 wafers per hour in 2030 and beyond.",
  "title": "ASML makes breakthrough in EUV chipmaking tech, plans to increase speed by 50% by 2030 — new 1,000-watt light source fires three lasers at 100,000 tin droplets every second",
  "updatedAt": "2026-02-24T12:01:58.000Z"
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